BPS-4 Pump Serie

Flow rate: 140 l/min Pressure: 4.1 bar

System Benefits:

  • Improves CMP production yields by producing 200 to 1000 times less scraping particles than other pumps
  • Increases filter life in CMP recirculation loops by up to 15 by generating fewer gels and large particles
  • Reduces particle contamination problems in wet processes by generating 10 to 50 times fewer particles
  • Improves and simplifies process control by eliminating pulsations, accurately controlling the rotor’s flow and speed
  • Reduces maintenance costs by decreasing the component’s wear
  • Increases equipment uptime and reduces maintenance costs in plating applications by providing clogging-free operation
  • Saves valuable space in processing tools by having a very small footprint
Product Category :
Pumps
Product Brand :
Levitronix