NOTE! The BPS-3 is part of the first generation of ultra-pure stepless pumps. For new applications, please refer to the successor model BPS-600.

The first generation Levitronix BPS-3 pump is designed for ultra-pure processing of delicate fluids in wet microelectronic applications.

Based on active magnetic levitation, the pump wheel is suspended and driven by the magnetic field of the motor. The large gap ensures that there is no mechanical contact between the moving parts and therefore no wear. There are no bearings to wear or seals to deteriorate. Both the wheel and the case are made from high-purity chemical-resistant fluoropolymer resins.

The flow and pressure of the fluid are precisely controlled by electronically regulating the speed of the wheel.

System Benefits :

• Improves CMP production yields by producing 200 to 1000 times less scraping particles than other pumps
• Increases filter life in CMP recirculation loops by up to 15 by generating fewer gels and large particles
• Reduces particle contamination problems in wet processes by generating 10 to 50 times fewer particles
• Improves and simplifies process control by eliminating pulsations and accurately controlling rotor flow and speed
• Increases equipment availability and reduces maintenance costs by reducing part wear
• Increases equipment uptime and reduces maintenance costs in plating applications by providing clogging-free operation
• Saves valuable space in processing tools by having a very small footprint