Flow rate: 140 l/min Pressure: 4.1 bar
System Benefits:
- Improves CMP production yields by producing 200 to 1000 times less scraping particles than other pumps
- Increases filter life in CMP recirculation loops by up to 15 by generating fewer gels and large particles
- Reduces particle contamination problems in wet processes by generating 10 to 50 times fewer particles
- Improves and simplifies process control by eliminating pulsations, accurately controlling the rotor’s flow and speed
- Reduces maintenance costs by decreasing the component’s wear
- Increases equipment uptime and reduces maintenance costs in plating applications by providing clogging-free operation
- Saves valuable space in processing tools by having a very small footprint
Product Category :
Pumps
Pumps
Product Brand :
Levitronix
Levitronix